Blocking resistance is often dependent on polymer hardness. Low film formation temperature is however also desirable. Using chemistry to create this then again compromises the chemical resistance properties of the paint.
As a result of our persistent R&D efforts we have developed better solutions to address this issue.
The work is presented by our R&D Manager Gun Lundsten in the latest issue of Polymer Paint Colour Journal, March 2019. Read the article here: G_Lundsten_PPCJ_Vol_209_No 4649_(2019)_ pp_30-32